Application of Total-reflection X-ray Fluorescence Analysis
doi: 10.11804/NuclPhysRev.12.03.034
- Received Date: 1900-01-01
- Rev Recd Date: 1900-01-01
- Publish Date: 1995-09-20
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Key words:
- total-reflection /
- glancing angle /
- detection limits /
- trace analysis
Abstract: In recent years a remarkable development has been achieved in total-reflection X-ray fluorescence (TXRF) analysis techniques. The trace and ulera-trace analysis of elements has been made out from surface and near-surface layer to depth and depth profiling as well as layered structures. Absolute detectoion limits has come to pg-level and the least detection limits of 108atoms/cm2 can be reached for surface contamination on St wafers. The basic theory, characteristic, recent...
Citation: | Tian Yuhong, Wang Ruiguang, Tan Ji-lian. Application of Total-reflection X-ray Fluorescence Analysis[J]. Nuclear Physics Review, 1995, 12(3): 34-39. doi: 10.11804/NuclPhysRev.12.03.034 |