Development of a Multi-Sample High Intensity Cs Sputter Ion Source

Multi-sample high intensity Cs sputter ion source is one of the common ion sources in various accelerators, and has been widely used in scientific research and industrial production. However, the commercial products of this kind of ion source are monopolized by several European and American countries, and currently no domestic manufacturer can produce it. In order to enhance the independent innovation capability in accelerator operation and development, a multi-sample high intensity Cs sputter ion source was specially developed. The ion source mainly consists of ion source cavity, target replacement device, cooling system and control cabinet. According to the functional requirements, the key components of ion source were designed. A new servo motor-driven target method was adopted to provide fine-tuning of target position and remote control mode. And the Opera-3D software was used to simulate beam trajectory and optimize structural parameters. After testing, the ion source has been successfully used in a 400 kV compact accelerator mass spectrometer(AMS) independently developed by the China Institute of Atomic Energy. The sample is accurately positioned, and the beam current is stable. Beam parameters are as good as those of imported ion source, so the expected goal has been achieved.