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ZHOU Han, ZHOU Fuzeng, FU Kaihu, HUANG Jie, CHEN Lin, LIAO Bin, ZHANG Xu. Optical Emission Diagonositcs of Plasma Used for TiC Deposition[J]. Nuclear Physics Review, 2015, 32(S1): 79-83. DOI: 10.11804/NuclPhysRev.32.S1.79
Citation: ZHOU Han, ZHOU Fuzeng, FU Kaihu, HUANG Jie, CHEN Lin, LIAO Bin, ZHANG Xu. Optical Emission Diagonositcs of Plasma Used for TiC Deposition[J]. Nuclear Physics Review, 2015, 32(S1): 79-83. DOI: 10.11804/NuclPhysRev.32.S1.79

Optical Emission Diagonositcs of Plasma Used for TiC Deposition

  • Optical diagnostics of high density and ionization plasma generated by Filter cathodic arc vacuum arc(FCVA) technique were investigated in this paper. The effects of acetylene flow rate on the plasma parameter of TiC were also been studied by optical emission spectroscopy. The plasma parameters were calculated using Saha-Boltzmann method. Results show that the plasma has high degree of ionization, and there is little effect of the acetylene flow rate on ionization degree. The electron temperature ranges from 1104 to 2104 K, the electron density ranges from 1023 to 1024 m*3, and they all increase firstly and then decrease, with the increase of the acetylene flow rate. The relative intensity of the Ti varies little as the flow rate increases, which indicate that most of Ti plasma was ionized around the cathodic arc spot.
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