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ZHANG Hongxiu, HONG Mengqing, XIAO Xiangheng, REN Feng, JIANG Changzhong. Research Progress on Radiation Tolerance of Multilayer Nanofilms[J]. Nuclear Physics Review, 2013, 30(4): 451-459. DOI: 10.11804/NuclPhysRev.30.04.451
Citation: ZHANG Hongxiu, HONG Mengqing, XIAO Xiangheng, REN Feng, JIANG Changzhong. Research Progress on Radiation Tolerance of Multilayer Nanofilms[J]. Nuclear Physics Review, 2013, 30(4): 451-459. DOI: 10.11804/NuclPhysRev.30.04.451
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Research Progress on Radiation Tolerance of Multilayer Nanofilms

  • School of Physics and Technology, Wuhan University, Wuhan 430072 ,China

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  • Received Date: December 31, 1899
  • Revised Date: December 31, 1899
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    • Abstract
  • Numerous studies show that interface can serve as effective sinks for radiation-induced defects such as interstitials and vacancies. Owning a large number of interfaces, multilayer nanofilms attract a great research interest. In this paper, we review recent research progress on the development of the multilayer nanofilms for the purpose of radiation tolerance. The paper includes following parts: how to design and prepare multilayer nanofilms materials; evaluation with radiation simulation, such as neutron irradiation, ion irradiation and multi-beam ion irradiation; behaviors of multilayer nanofilms under ion beam irradiation, such as microstructure evolution and changes in mechanical properties; theoretical study on the mechanism of radiation tolerance of multilayer nanofilms. Finally, the challenge and future research directions are briefly discussed.
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