高剂量与高能量离了注入研究进展

Development of High dose and High energy Ion Implantation

摘要: 综述了离子束材料实验室在高剂量与高能量离子注入研究方面的新进展，包括高剂量离子注入动态靶的模拟计算ＭＡＣＡ程序、多能离子注入深度分布计算、ＭｅＶ离子引起的ＨＯＰＧ表面操作、ＭｅＶ离子诱变右旋糖酐生产菌种、高剂量离子注入在４５号钢表面形成耐腐蚀的保护层以及在高速工具钢上形成含有大量超细碳化物的耐磨层. The development of high dose ion implantation and high energy ion implantation at the Ion Beam Application Group of IHIP in recent years is reviewed.

Abstract: The development of high dose ion implantation and high energy ion implantation at the Ion Beam Application Group of IHIP in recent years is reviewed.