Preparation and Characterization of ZnO Films by Modified SILAR Method
doi: 10.11804/NuclPhysRev.26.02.154
- Received Date: 1900-01-01
- Rev Recd Date: 1900-01-01
- Publish Date: 2009-06-20
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Key words:
- SILAR method /
- zinc oxide /
- thin film /
- characterization
Abstract: A modified solution method,successive ionic layer adsorption and reaction(SILAR),was applied to prepare transparent zinc oxide(ZnO) film on glass substrate at (125±5) ℃ in mixed ion precursor solution. The surface morphology and crystallizations of films were analyzed by field emission scanning microscopy(FESEM) and Xray diffraction(XRD), respectively. The optical properties of the films were studied by ultraviolet visible(UVVis)spectroscopy. The results show that the obtained samples are polycrystalline films of hexagonal wurtzite structure,with the preference of [002\] orientation. The asdeposited films exhibit uniform and compact surface morphology, with the film thickness of 550 nm, and have high transmittance in the visible band(>80%).
Citation: | ZHANG Ling, LIU Jie, HOU Ming-dong, SUN You-mei, DUAN Jin-lai, YAO Hui-jun, MO Dan, CHEN Yan-feng. Preparation and Characterization of ZnO Films by Modified SILAR Method[J]. Nuclear Physics Review, 2009, 26(2): 154-157. doi: 10.11804/NuclPhysRev.26.02.154 |