Application of Total-reflection X-ray Fluorescence Analysis

Tian Yuhong; Wang Ruiguang; Tan Ji-lian

doi:10.11804/NuclPhysRev.12.03.034

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Volume 12 Issue 3

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Article Navigation > Nuclear Physics Review > 1995 > 12(3): 34-39

Tian Yuhong, Wang Ruiguang, Tan Ji-lian. Application of Total-reflection X-ray Fluorescence Analysis[J]. Nuclear Physics Review, 1995, 12(3): 34-39. doi: 10.11804/NuclPhysRev.12.03.034

Citation:

Tian Yuhong, Wang Ruiguang, Tan Ji-lian. Application of Total-reflection X-ray Fluorescence Analysis[J]. Nuclear Physics Review, 1995, 12(3): 34-39. doi: 10.11804/NuclPhysRev.12.03.034

Application of Total-reflection X-ray Fluorescence Analysis

doi: 10.11804/NuclPhysRev.12.03.034

1 Department of Yantai University; Yantai 264005 2 Institute of Modern Physics; Chinese Academy of Sciences; Lanzhou 730000

Received Date: 1900-01-01
Rev Recd Date: 1900-01-01
Publish Date: 1995-09-20

Abstract

In recent years a remarkable development has been achieved in total-reflection X-ray fluorescence (TXRF) analysis techniques. The trace and ulera-trace analysis of elements has been made out from surface and near-surface layer to depth and depth profiling as well as layered structures. Absolute detectoion limits has come to pg-level and the least detection limits of 108atoms/cm2 can be reached for surface contamination on St wafers. The basic theory, characteristic, recent...
- total-reflection,
- glancing angle,
- detection limits,
- trace analysis
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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

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