| [1] | PADAMSEE H, KNOBLOC J, HAYS T, et al. RF superconductivity for accelerators. New York:WILY-VCH, 2008. |
| [2] | SCHWETTMAN A H, TURNEAURE P J, WAITES F R, et al. Journal of Applied Physics, 1974, 45:914. |
| [3] | TYAGI V P, DOLEANS M, HANNAH B, et al. Appl Surf Sci, 2016, 369:29. |
| [4] | DOLEANS M, TYAGI V P, AFANADOR R, et al. Nucl Instr Method A, 2016, 812:50. |
| [5] | CST Simulation Packages, https://www.cst.com/. |
| [6] | http://www.bbef-tech.com/. |
| [7] | AHMED S, MAMMOSSER D J. Review of Scientific Instruments, 2015, 86:073303. |
| [8] | GE M, FURUTA F, HOFFSTAETTER G, et al. Efforts of the Improvement of Cavity Q-Value by Plasma Cleaning Technology:Plan and Results from Cornell Unviversity[C]//Proceeding of SRF2015, 2015. |
| [9] | LIEBERMAN M A, LICHTENBERG A J. Principle of Plasma Discharges and Materials Processing[M]. Hoboken:John Wiley & Sons, 2005. |
| [10] | YOUNUS M, REHMAN U N, SHAFIQ M, et al. Physics of Plasmas, 2016, 23:083521. |
| [11] | CHUNG H T, KANG R H, BAE K M, et al. Physics of Plasmas, 2012, 19:113502. |
| [12] | GRIEM R H. Principles of Plasma Spectroscopy[M]. Cambridge:Cambridge University Press, 1997. |
| [13] | https://www.nist.gov/pml/atomic-spectra-database/. |
| [14] | WU H, ZHAO Y P, CUI H Y, et al. Diagnostics of Electron Temperature and Density in a Capillary Predischarge Ar Plasma[C]//International Academic Symposium on Optoelectronics and Microelectronics Technology, 2011. |
| [15] | CHEN F F, CHANG J P. Lecture Notes on Principles of Plasma Processing. Los Angeles:Plenum/Kluwer Publishers, 2002. |